Low Temperature Plasma Physics : Fundamental Aspects and Applications

Low Temperature Plasma Physics : Fundamental Aspects and Applications

Editorial Reviews
Review
"...describes the fundamentals and applications of low-temperature plasma physics, with an emphasis on recent achievements." (SciTech Book News, Vol. 26, No. 2, June 2002)

Book Description
Low-temperature plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments, e.g. in plasma etching or plasma deposition, have led to a revived interest in plasma physics and technology. This volume describes in detail fundamentals and applications of low-temperature plasma physics including newest achievements. The authors of this volume are top scientists from the USA and Europe who present most recent successes in our understanding of how plasmas behave and put a strong focus on the links between theory and experiment or technological process.

Low Temperature Plasma Physics: Fundamental Aspects and Applications,Rainer Hippler,Sigismund Pfau,Martin Schmidt,Karl H. Schoenbach,Wiley-VCH,3527288872,Chemistry - General,Low Temperature Physics,Low temperature plasmas,Mechanics - Dynamics - Thermodynamics,Physics,Plasma (Ionized gases),Plasma Physics,Science,Science/Mathematics,Science / Chemistry / General

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